The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Dec. 07, 1998
Kevin D. Lucas, Austin, TX (US);
Christopher D. Pettinato, Austin, TX (US);
Wayne D. Clark, Driftwood, TX (US);
Stanley M. Filipiak, Pflugerville, TX (US);
Yeong Jyh Lii, Austin, TX (US);
Motorola Inc., Schaumburg, IL (US);
Abstract
A hardmask layer (,) is formed over insulating layers (,and,), and an antireflective layer (,) is formed overlying the hardmask layer (,). A resist layer (,) is formed overlying the antireflective layer (,), and an opening is formed in the resist layer to expose a surface portion of the antireflective layer (,). The exposed surface portion of the antireflective layer (,) and portions of the hardmask layer (,) are etched to expose a surface portion of the insulating layers (,and,), and a feature opening (,) is formed in the insulating layers (,and,). A conductive material (,) is deposited to fill the feature opening (,), and portions of the conductive material (,) lying outside the opening are removed.