Company Filing History:
Years Active: 2001
Title: **Inventor Spotlight: Christopher D Pettinato**
Introduction
Christopher D Pettinato is a notable inventor based in Austin, TX, specializing in innovative processes within the technology sector. With a keen eye for detail and a passion for advancing semiconductor fabrication techniques, his work contributes significantly to the efficiency of material usage in electronics.
Latest Patents
Pettinato holds a patent for a "Process for forming a combination hardmask and antireflective layer." This innovative process involves the formation of a hardmask layer over insulating layers, subsequently layered with an antireflective layer. A resist layer is applied on top, allowing for the creation of openings that expose portions of the underlying layers. The etching process then reveals the insulating layers beneath, leading to the filling of feature openings with conductive material, thus enhancing the manufacturing process in semiconductor technology.
Career Highlights
Currently, Christopher is employed at Motorola Corporation, where he continues to push the boundaries of technology through innovative solutions. His dedication to the field has earned him recognition among his peers, solidifying his role as an influential figure in his area of expertise.
Collaborations
Throughout his career, Pettinato has collaborated with esteemed colleagues, including Kevin D Lucas and Wayne D Clark. These partnerships have further enriched his work, fostering an environment of creativity and shared expertise in the development of new technologies.
Conclusion
Christopher D Pettinato exemplifies the spirit of innovation and ingenuity in the field of technology. His contributions through patenting unique processes not only enhance manufacturing techniques but also demonstrate the importance of collaboration in driving advancements in the semiconductor industry. As he continues to innovate at Motorola Corporation, the impact of his work will undoubtedly shape the future of electronic materials and processes.