This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Wayne D. Clark: Innovator in Semiconductor Technology
Introduction
Wayne D. Clark is a notable inventor based in Driftwood, TX (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and creativity have positioned him as a valuable asset in the industry.
Latest Patents
Wayne D. Clark holds a patent for a "Process for forming a combination hardmask and antireflective layer." This patent describes a method where a hardmask layer is formed over insulating layers, followed by the formation of an antireflective layer over the hardmask. A resist layer is then applied, and an opening is created to expose a portion of the antireflective layer. The exposed areas are etched to reveal parts of the insulating layers, ultimately allowing for the deposition of conductive material to fill the feature opening.
Career Highlights
Wayne D. Clark is associated with Motorola Corporation, where he has contributed to various projects and innovations. His work has been instrumental in advancing semiconductor manufacturing processes, showcasing his technical skills and innovative mindset.
Collaborations
Throughout his career, Wayne has collaborated with talented individuals such as Christopher D. Pettinato and Stanley Michael Filipiak. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.
Conclusion
Wayne D. Clark's contributions to semiconductor technology through his patent and work at Motorola Corporation highlight his role as an influential inventor. His innovative processes continue to impact the industry positively.