Kei Hayasaki

This inventor holds 33 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2001-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kei Hayasaki. Retrieved from https://idiyas.com/inventor/kei-hayasaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 (Patent Applications = 3)

% Patents Active = 21.2

Average Co-Inventor Count = 4.0

ph-index = 7

Forward Citations = 132(Granted Patents)

Location History:

Yokohama, JP (2001 - 2004)
Kamakura, JP (2001 - 2011)

Company Filing History:

33 out of 53,250

Kabushiki Kaisha Toshiba

patents

Years Active: 2001-2011

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Areas of Expertise:

Pattern Forming

Substrate Processing

Film Forming

Semiconductor Device

Photoresist Evaluation

Temperature Calibration

Alkaline Solution

Process Condition Determination

Exposure Dose Measuring

Heating Device

Sensitivity Evaluation

Developing Method

33 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8071157 - Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus (2011-12-06),

2. 7972765 - Pattern forming method and a semiconductor device manufacturing method (2011-07-05),

3. 7968272 - Semiconductor device manufacturing method to form resist pattern (2011-06-28),

4. 7903264 - Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus (2011-03-08),

5. 7794923 - Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device (2010-09-14),

6. 7683291 - Substrate processing method and manufacturing method of semiconductor device (2010-03-23),

7. 7669608 - Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle (2010-03-02),

8. 7662546 - Apparatus for processing substrate and method of processing the same (2010-02-16),

9. 7604832 - Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus (2009-10-20),

10. 7563561 - Pattern forming method and a semiconductor device manufacturing method (2009-07-21),

11. 7510341 - Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus (2009-03-31),

12. 7483155 - Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus (2009-01-27),

13. 7399578 - Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method (2008-07-15),

14. 7368209 - Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device (2008-05-06),

15. 7364839 - Method for forming a pattern and substrate-processing apparatus (2008-04-29),

Title: The Innovator Extraordinaire: Kei Hayasaki's Journey in Inventions

Introduction:

Renowned inventor Kei Hayasaki, hailing from the vibrant city of Kamakura, JP, has left an indelible mark on the world of inventions with his unwavering passion for innovation and relentless pursuit of excellence. With a total of 33 patents under his belt, his dedication to pushing the boundaries of technology continues to inspire aspiring inventors and innovators worldwide.

Latest Patents:

Among his latest patents are a Film Forming Method, Film Forming Apparatus, Pattern Forming Method, and Manufacturing Method of Semiconductor Apparatus. These groundbreaking inventions demonstrate his expertise in areas such as continuous solution discharge, pattern forming techniques, and semiconductor device manufacturing methods.

Career Highlights:

Kei Hayasaki's illustrious career is highlighted by his invaluable contributions to Kabushiki Kaisha Toshiba, a prestigious company at the forefront of technological advancements. His innovative spirit and visionary approach have significantly impacted the company's growth and success in the competitive tech industry.

Collaborations:

Throughout his career, Kei Hayasaki has worked closely with esteemed colleagues such as Shinichi Ito and Kenji Kawano. Their collaborative efforts have led to the development of cutting-edge technologies and solutions that have reshaped the landscape of modern inventions.

Conclusion:

In conclusion, Kei Hayasaki's remarkable journey as an inventor exemplifies the transformative power of innovation and the importance of pushing the boundaries of what is possible. His dedication to excellence and unwavering commitment to technological advancements continue to shape the future of inventions, leaving a lasting legacy for generations to come.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

3 patents pending: