The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
Jul. 27, 2006
Applicants:
Riichiro Takahashi, Yokohama, JP;
Kei Hayasaki, Kamakura, JP;
Tomoyuki Takeishi, Yokohama, JP;
Shinichi Ito, Yokohama, JP;
Inventors:
Riichiro Takahashi, Yokohama, JP;
Kei Hayasaki, Kamakura, JP;
Tomoyuki Takeishi, Yokohama, JP;
Shinichi Ito, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
Takahashi, Riichiro. (2008). Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method (U.S. Patent No. 7399578). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7399578
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile