Company Filing History:

11 out of 52,711

Kabushiki Kaisha Toshiba

where one patent can have more than one assignee

Years Active: 2004-2010

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7727853 - Processing method, manufacturing method of semiconductor device, and processing apparatus (2010-06-01),

2. 7669608 - Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle (2010-03-02),

3. 7399578 - Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method (2008-07-15),

4. 7288466 - Processing method, manufacturing method of semiconductor device, and processing apparatus (2007-10-30),

5. 7097960 - Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method (2006-08-29),

6. 7067033 - Chemical liquid processing apparatus for processing a substrate (2006-06-27),

7. 7018481 - Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle (2006-03-28),

8. 6842281 - Observation device, ultraviolet microscope and observation method (2005-01-11),

9. 6818387 - Method of forming a pattern (2004-11-16),

10. 6742944 - ALKALINE SOLUTION AND MANUFACTURING METHOD, AND ALKALINE SOLUTION APPLIED TO PATTERN FORMING METHOD, RESIST FILM REMOVING METHOD, SOLUTION APPLICATION METHOD, SUBSTRATE TREATMENT METHOD, SOLUTION SUPPLY METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD (2004-06-01),

11. 6709531 - Chemical liquid processing apparatus for processing a substrate and the method thereof (2004-03-23),

Title: The Innovative Journey of Inventor Riichiro Takahashi

Introduction

Riichiro Takahashi, an accomplished inventor based in Yokohama, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 11 patents, he has established himself as a key figure in the development and improvement of semiconductor devices and processing methods.

Latest Patents

Takahashi’s latest patents encompass a range of innovative technologies. One notable patent outlines a processing method for selectively reducing or removing exposed regions in films formed on substrates through energy rays. This method involves the relative scanning of a first exposure light, enabling precise removal or reduction of specific regions.

Another significant patent details a substrate treating method and apparatus, which involves the continuous discharge of a cleaning solution onto substrates while moving a nozzle in relation to the substrate. This innovative approach optimizes the cleaning process, ensuring efficiency and effectiveness in the semiconductor manufacturing process.

Career Highlights

Throughout his career, Riichiro Takahashi has worked for leading companies including Kabushiki Kaisha Toshiba and Nikon Corporation. His roles in these organizations allowed him to experiment and develop groundbreaking technologies in semiconductor processing, further solidifying his reputation as a leading inventor in the field.

Collaborations

During his illustrious career, Takahashi has collaborated with notable coworkers such as Shinichi Ito and Kei Hayasaki. These partnerships have fostered an environment of creativity and innovation, leading to the successful development of various technologies that enhance semiconductor manufacturing processes.

Conclusion

Riichiro Takahashi’s contributions to the field of semiconductor devices and processing methods are invaluable. His 11 patents reflect a commitment to innovation and excellence within the industry. As he continues to push the boundaries of technology, his work will undoubtedly inspire future generations of inventors and technologists.

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