The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Jul. 01, 2008
Tomoyuki Takeishi, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Hiroshi Ikegami, Hiratsuka, JP;
Shinichi Ito, Yokohama, JP;
Riichiro Takahashi, Yokohama, JP;
Tomoyuki Takeishi, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Hiroshi Ikegami, Hiratsuka, JP;
Shinichi Ito, Yokohama, JP;
Riichiro Takahashi, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.