The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Feb. 11, 2004
Shinichi Ito, Kanagawa-ken, JP;
Riichiro Takahashi, Kanagawa-ken, JP;
Tatsuhiko Ema, Kanagawa-ken, JP;
Katsuya Okamura, Kanagawa-ken, JP;
Shinichi Ito, Kanagawa-ken, JP;
Riichiro Takahashi, Kanagawa-ken, JP;
Tatsuhiko Ema, Kanagawa-ken, JP;
Katsuya Okamura, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.