The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Jul. 23, 2003
Applicants:
Kei Hayasaki, Kamakura, JP;
Shinichi Ito, Yokohama, JP;
Tomoyuki Takeishi, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Tatsuhiko Ema, Kamakura, JP;
Inventors:
Kei Hayasaki, Kamakura, JP;
Shinichi Ito, Yokohama, JP;
Tomoyuki Takeishi, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Tatsuhiko Ema, Kamakura, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.