The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Aug. 27, 2004
Shinichi Ito, Yokohama, JP;
Tatsuhiko Ema, Kamakura, JP;
Kei Hayasaki, Kamakura, JP;
Rempei Nakata, Kamakura, JP;
Nobuhide Yamada, Tokyo, JP;
Katsuya Okumura, Tokyo, JP;
Shinichi Ito, Yokohama, JP;
Tatsuhiko Ema, Kamakura, JP;
Kei Hayasaki, Kamakura, JP;
Rempei Nakata, Kamakura, JP;
Nobuhide Yamada, Tokyo, JP;
Katsuya Okumura, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10qγ (mm) given with respect to a surface tension γ (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10(m·sec/N).