The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Jan. 18, 2007
Eishi Shiobara, Yokohama, JP;
Kentaro Matsunaga, Kawasaki, JP;
Daisuke Kawamura, Yokohama, JP;
Tomoyuki Takeishi, Yokkaichi, JP;
Kei Hayasaki, Kamakura, JP;
Shinichi Ito, Yokohama, JP;
Eishi Shiobara, Yokohama, JP;
Kentaro Matsunaga, Kawasaki, JP;
Daisuke Kawamura, Yokohama, JP;
Tomoyuki Takeishi, Yokkaichi, JP;
Kei Hayasaki, Kamakura, JP;
Shinichi Ito, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing target substrate that is provided for liquid immersion exposure for carrying out the exposure treatment at a side to be applied with the exposure treatment, selectively applying at least hydrophobic treatment with respect to a region in a predetermined range from a peripheral rim part of a second main face opposite to the first main face.