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For the Inventor, By the Inventor

Yokohama, Japan

Daisuke Kawamura

USPTO Granted Patents = 27

Average Co-Inventor Count = 2.1

ph-index = 6

Forward Citations = 84(Granted Patents)


Location History:

  • Chiba-ken, JP (2011)
  • Kanagawa, JP (2005 - 2012)
  • Yokohama, JP (2003 - 2015)

Company Filing History:

goldMedal27 out of 52,711 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2003-2015

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27 patents (USPTO):
1. 9023432 - Resist material for imprinting, pattern formation method, and imprinting apparatus (2015-05-05),
2. 8865580 - Pattern forming method, semiconductor device manufacturing method, and coating apparatus (2014-10-21),
3. 8673771 - Pattern forming method (2014-03-18),
4. 8122848 - Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices (2012-02-28),
5. 7973907 - Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate (2011-07-05),
6. 7968272 - Semiconductor device manufacturing method to form resist pattern (2011-06-28),
7. 7794923 - Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device (2010-09-14),
8. 7794922 - Pattern forming method and method of manufacturing semiconductor device (2010-09-14),
9. 7749665 - Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device (2010-07-06),
10. 7742150 - Manufacturing method of semiconductor device (2010-06-22),
11. 7687227 - Resist pattern forming method and manufacturing method of semiconductor device (2010-03-30),
12. 7685556 - Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method (2010-03-23),
13. 7662546 - Apparatus for processing substrate and method of processing the same (2010-02-16),
14. 7662543 - Pattern forming method and method of manufacturing semiconductor device (2010-02-16),
15. 7652747 - Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium (2010-01-26),

Title: The Innovative Contributions of Daisuke Kawamura

Introduction: Daisuke Kawamura is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of semiconductor manufacturing. With a remarkable portfolio of 27 patents, Kawamura has demonstrated his innovative spirit and technical expertise, particularly in resist materials and pattern formation methods.

Latest Patents: Among his latest inventions, Kawamura has developed a resist material for imprinting, which includes a first resin component that remains nonvolatile at the substrate, a second volatile resin component, and a coupling reaction initiator to enhance the curing process of the first resin. Additionally, he has patented a pattern forming method that improves semiconductor device manufacturing by forming a resist pattern on a substrate, followed by the application of a coating film with a specific thickness distribution. This innovative method allows for the uniform thinning of the coating film and enables precise pattern formation on the substrate while preserving the integrity of the coating film.

Career Highlights: Daisuke Kawamura is a key member at Kabushiki Kaisha Toshiba, a leading technology company known for its advancements in electronics and semiconductor applications. His work focuses on developing materials and methods that enhance manufacturing processes, contributing significantly to the field of advanced technology.

Collaborations: Throughout his career, Kawamura has collaborated with notable colleagues such as Shinichi Ito and Eishi Shiobara. These collaborations have fostered a creative environment, allowing for the exchange of ideas and the development of innovative solutions in the high-tech industry.

Conclusion: Daisuke Kawamura's contributions to the field of semiconductor technology and his impressive patent portfolio underscore his role as a leading inventor in Japan. His latest advancements in resist materials and pattern formation methods not only reflect his technical prowess but also significantly impact the future of semiconductor manufacturing.

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