The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Oct. 30, 2008
Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate
Applicants:
Kentaro Matsunaga, Kanagawa-ken, JP;
Daisuke Kawamura, Chiba-ken, JP;
Seiro Miyoshi, Kanagawa-ken, JP;
Eishi Shiobara, Kanagawa-ken, JP;
Inventors:
Kentaro Matsunaga, Kanagawa-ken, JP;
Daisuke Kawamura, Chiba-ken, JP;
Seiro Miyoshi, Kanagawa-ken, JP;
Eishi Shiobara, Kanagawa-ken, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.