The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 28, 2012
Daisuke Kawamura, Yokohama, JP;
Daisuke Kawamura, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a pattern forming method comprises forming, on a metal layer and an insulating layer, an underlying layer the surface state of which is changeable by irradiation with a light ray, radiating the light ray to the underlying layer, thereby changing the surface state of a portion of the underlying layer above the metal layer, forming a block polymer layer on the underlying layer, forming, on the underlying layer, a directed self-assembly phase which contains a first polymer portion and a second polymer portion, the first polymer portion being positioned above the underlying layer portion the surface state of which has been changed by the radiation of the light ray, removing the first polymer portion, and the underlying layer portion underneath the first polymer portion to make a hole, and burying a conductive film into the hole.