Kasugai, Japan

Kazukuni Hara


 

Average Co-Inventor Count = 3.9

ph-index = 8

Forward Citations = 752(Granted Patents)


Location History:

  • Oobu, JP (1999)
  • Obu, JP (1998 - 2000)
  • Kariya, JP (2001 - 2019)
  • Kasugai, JP (2000 - 2021)
  • Aichi, JP (2020 - 2021)

Company Filing History:


Years Active: 1998-2021

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22 patents (USPTO):

Title: Innovations of Kazukuni Hara: Pioneering SiC Technologies

Introduction: Kazukuni Hara, an inventive mind based in Kasugai, Japan, holds an impressive repertoire of 22 patents. With a focus on Silicon Carbide (SiC) technologies, his work significantly contributes to advancements in the semiconductor industry.

Latest Patents: Hara's latest patents include a method for producing a SiC epitaxial wafer, which outlines a unique process involving the epitaxial growth of a layer on a SiC single crystal substrate. This process utilizes various raw gas materials, ensuring optimal growth conditions, which include a film deposition pressure of 30 torr or less, a Cl/Si ratio within a range of 8 to 12, a C/Si ratio between 0.8 and 1.2, and a substantial growth rate of 50 μm/h or more right from the initial growth stages. Additionally, his innovative film forming apparatus features a detailed piping system designed to efficiently introduce gasses through specific flow paths, optimizing the production process.

Career Highlights: Hara has made significant contributions through his work at prominent companies such as Denso Corporation and Showa Denko K.K. His tenure at these organizations has provided him with a solid platform to develop and patent his groundbreaking inventions in materials science.

Collaborations: Throughout his career, Hara has had the opportunity to collaborate with esteemed colleagues including Shoichi Onda and Masami Naito. Their collective expertise in the field has been paramount in driving forward innovative solutions in SiC technologies.

Conclusion: Kazukuni Hara's extensive patent portfolio and his continuous work in the semiconductor sphere exemplify the spirit of innovation. His latest patents reflect a deep understanding of material science and a commitment to developing efficient production methods, cementing his status as a key figure in advancing SiC technology.

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