The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Nov. 15, 2017
Applicant:

Nuflare Technology, Inc., Yokohama-shi, Kanagawa, JP;

Inventors:

Kunihiko Suzuki, Shizuoka, JP;

Naohisa Ikeya, Kanagawa, JP;

Masayoshi Yajima, Kanagawa, JP;

Kazukuni Hara, Aichi, JP;

Hiroaki Fujibayashi, Aichi, JP;

Hideki Matsuura, Aichi, JP;

Katsumi Suzuki, Aichi, JP;

Assignee:

NuFlare Technology, Inc., Yokohama-shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C30B 25/10 (2006.01); C23C 16/46 (2006.01); C30B 25/14 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01); C30B 25/16 (2006.01); C30B 29/36 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C30B 25/10 (2013.01); C23C 16/4411 (2013.01); C23C 16/45561 (2013.01); C23C 16/45563 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/45582 (2013.01); C23C 16/45585 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C30B 25/14 (2013.01); C30B 25/165 (2013.01); C30B 29/36 (2013.01);
Abstract

A film forming apparatus according to an embodiment includes: a film forming chamber configured to house therein a substrate to perform film forming processing; a gas supplier located in an upper part of the film forming chamber and configured to supply a process gas onto the substrate; and a heater configured to heat the substrate, wherein the film forming chamber has a temperature-increase suppression region being a lower part of the gas supplier and suppressing a temperature increase of the gas supplied to an upper part of the heater.


Find Patent Forward Citations

Loading…