Location History:
- Nirasaki, JP (2009 - 2014)
- Yamanashi, JP (2014)
- Miyagi, JP (2015 - 2016)
- Singapore, SG (2022)
Company Filing History:
Years Active: 2009-2022
Title: Kazuki Narishige: Innovator in Semiconductor Processing Technologies
Introduction
Kazuki Narishige is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 13 patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Narishige's latest patents include a substrate processing method and a semiconductor device manufacturing method. The substrate processing method involves a chamber equipped with a substrate support, an upper electrode, and a gas supply port. This method includes several steps, such as providing the substrate on the support, supplying a first processing gas, and generating plasma through a continuous RF signal and a negative DC voltage. The process is designed to optimize the generation of plasma, with specific timing for each step to ensure efficiency.
The semiconductor device manufacturing method involves preparing a target object with a multilayer film and a mask in a plasma processing apparatus. The multilayer film consists of alternating silicon oxide and silicon nitride films. The etching process utilizes a specific processing gas mixture to generate plasma, allowing for precise manufacturing of semiconductor devices.
Career Highlights
Kazuki Narishige is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that are critical for modern electronics. His expertise in plasma processing has positioned him as a key figure in the development of innovative manufacturing techniques.
Collaborations
Throughout his career, Narishige has collaborated with notable colleagues, including Takanori Sato and Manabu Sato. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects within the semiconductor field.
Conclusion
Kazuki Narishige's contributions to semiconductor processing technologies are noteworthy and impactful. His patents reflect a deep understanding of the complexities involved in substrate processing and device manufacturing. As he continues to innovate, his work will undoubtedly influence the future of semiconductor technology.