The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Mar. 26, 2009
Masanobu Honda, Nirasaki, JP;
Kenji Masuzawa, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Manabu Iwata, Nirasaki, JP;
Manabu Sato, Boise, ID (US);
Kazuki Narishige, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Kenji Masuzawa, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Manabu Iwata, Nirasaki, JP;
Manabu Sato, Boise, ID (US);
Kazuki Narishige, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes an inner upper electrode provided to face a lower electrode mounting thereon a substrate, an outer upper electrode provided in a ring shape at a radially outside of the inner upper electrode and electrically isolated from the inner upper electrode in a vacuum evacuable processing chamber and a processing gas supply unit for supplying a processing gas into a processing space between the inner and the outer upper electrode and the lower electrode. A radio frequency (RF) power supply unit is also provide to apply a RF power to the lower electrode or the inner and the outer upper electrode to generate a plasma of the processing gas by RF discharge. A first and a second DC power supply unit are provided to apply a first and a second variable DC voltage to the inner upper electrode, respectively.