The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Sep. 07, 2010
Kazuki Narishige, Nirasaki, JP;
Kazuo Shigeta, Nirasaki, JP;
Kazuki Narishige, Nirasaki, JP;
Kazuo Shigeta, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for processing a target object includes arranging a first electrode and a second electrode for supporting the target object in parallel to each other in a processing chamber and processing the target object supported by the second electrode by using a plasma of a processing gas supplied into the processing chamber, the plasma being generated between the first electrode and the second electrode by applying a high frequency power between the first electrode and the second electrode. The target object includes an organic film and a photoresist layer formed on the organic film. The processing gas contains Hgas, and the organic film is etched by a plasma containing Hby using the photoresist layer as a mask while applying a negative DC voltage to the first electrode.