Company Filing History:

22 out of 10,295

Tokyo Electron Limited

Shin-etsu Chemical Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2001-2021

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22 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10886097 - Plasma processing apparatus and plasma processing method (2021-01-05),

2. 9887109 - Plasma etching method and plasma etching apparatus (2018-02-06),

3. 9881806 - Method of manufacturing a semiconductor device (2018-01-30),

4. 9460893 - Substrate processing apparatus (2016-10-04),

5. 9396968 - Etching method and etching apparatus (2016-07-19),

6. 9390935 - Etching method (2016-07-12),

7. 9349619 - Plasma etching method and plasma etching apparatus (2016-05-24),

8. 9330930 - Plasma etching method and semiconductor device manufacturing method (2016-05-03),

9. 9318340 - Method of manufacturing a semiconductor device (2016-04-19),

10. 9279184 - Method of forming a pattern and substrate processing system (2016-03-08),

11. 9257301 - Method of etching silicon oxide film (2016-02-09),

12. 9048178 - Plasma etching method and semiconductor device manufacturing method (2015-06-02),

13. 8790489 - Substrate processing apparatus and substrate processing method (2014-07-29),

14. 8187981 - Substrate processing method, substrate processing system, and computer-readable storage medium (2012-05-29),

15. 8075730 - Apparatus for manufacturing a semiconductor device (2011-12-13),

Title: **Kazuhiro Kubota: A Pioneer in Plasma Processing Technologies**

Introduction

Kazuhiro Kubota is a renowned inventor based in Miyagi, Japan. With an impressive portfolio that includes 22 patents, Kubota has significantly contributed to the field of plasma processing technologies, which are vital in various industries, including semiconductor manufacturing.

Latest Patents

Among his most notable inventions are the plasma processing apparatus and a plasma etching method. The plasma processing apparatus features a processing container equipped with an ion trapping member that separates the processing space from the non-processing space while allowing radicals and trapped ions to transverse. This innovative design includes multiple high-frequency power supplies that generate ions and radicals, facilitating enhanced processing efficiencies.

The plasma etching method encompasses a systematic approach including holding a substrate, supplying processing gas into the processing chamber, and converting the gas into plasma using high-frequency power. This method allows for precise control of the processing conditions, ensuring optimal results in etching and manufacturing processes.

Career Highlights

Kazuhiro Kubota has worked with notable companies such as Tokyo Electron Limited and Shin-Etsu Chemical Co., Ltd., where he honed his expertise in semiconductor-related technologies. His contributions have not only advanced production techniques but also paved the way for innovation in those fields.

Collaborations

Throughout his career, Kubota has collaborated with esteemed professionals like Masanobu Honda and Takayuki Katsunuma. These partnerships have facilitated knowledge sharing and innovation, leading to the successful development of various technological advancements in plasma processing.

Conclusion

Kazuhiro Kubota stands out as a key contributor to plasma processing technology. His inventions and collaborations have greatly influenced the industry, and his ongoing work continues to inspire future innovations. With an ever-growing list of patents, Kubota's legacy as an inventor remains firmly established in the field.

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