The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Jul. 06, 2012
Masaya Kawamata, Miyagi, JP;
Masanobu Honda, Miyagi, JP;
Kazuhiro Kubota, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus can suppress an edge gas from being diffused toward a center region of a substrate. An upper electrodeserving as a gas introducing unit configured to supply one kind of gas or different kinds of gases to a center region and an edge region of the substrate includes a center gas inlet sectionhaving a multiple number of gas holesfor a center gas; and an edge gas inlet sectionhaving a multiplicity of gas holesfor an edge gas. By providing a gas hole formation platehaving gas holescommunicating with the gas holesat a bottom surface of the edge gas inlet section, a vertical position of edge gas discharging openings can be adjusted.