The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Jul. 01, 2011
Masanobu Honda, Nirasaki, JP;
Kazuhiro Kubota, Nirasaki, JP;
Yoshinobu Ooya, Nirasaki, JP;
Masaru Nishino, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Kazuhiro Kubota, Nirasaki, JP;
Yoshinobu Ooya, Nirasaki, JP;
Masaru Nishino, Nirasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
The substrate processing apparatus includes a process chamber which accommodates a wafer and performs a plasma etching process on the wafer, an exhaust chamber which communicates with the process chamber, an exhaust plate which divides the process chamber from the exhaust chamber and prevents plasma inside the process chamber from leaking into the exhaust chamber, and an upper electrode plate arranged inside the exhaust chamber, wherein the exhaust plate includes a plurality of through holes, and the upper electrode plate includes a plurality of through holes, is capable of contacting the exhaust plate in parallel, and is capable of being spaced apart from the exhaust plate.