Kyoto, Japan

Katsumi Sameshima

This inventor holds 23 USPTO granted patents, primarily in Semiconductor Technology. Top assignees: Rohm Co., Ltd., Ebara Corporation, Kabushiki Kaisha Toshiba. Active years: 1993-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsumi Sameshima. Retrieved from https://idiyas.com/inventor/katsumi-sameshima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 91.3

Average Co-Inventor Count = 1.3

ph-index = 6

Forward Citations = 177(Granted Patents)


Company Filing History:


Years Active: 1993-2018

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Areas of Expertise:
Semiconductor Device
Ferroelectric Memory
Chip-on-Chip Structure
Plating Apparatus
Polishing Pad
Thin Film
Dielectric Film
Voltage Detector
Storage Device
Manufacturing Method
Substrate Holding
23 patents (USPTO):Explore Patents

Title: **Katsumi Sameshima: A Pioneer in Semiconductor Innovations**

Introduction

Katsumi Sameshima, based in Kyoto, Japan, has established himself as a prolific inventor with a remarkable portfolio of 23 patents. His work primarily focuses on the field of semiconductor devices, demonstrating innovative approaches that contribute significantly to technology advancements.

Latest Patents

Sameshima's most recent patents describe a sophisticated semiconductor chip design. This design includes a substrate with an electrode pad and an insulating layer that features an opening to expose part of the electrode pad's surface. A first conductive layer is formed on the exposed portion and extends to the insulating layer's surface, while a second conductive layer covers the first, featuring an outer edge that extends beyond that of the first layer. Notably, the outer edge of this second layer includes at least one curved portion, strategically placed between the outer edges of the first and second layers. This innovative structure enhances the performance and efficiency of semiconductor devices.

Career Highlights

Throughout his career, Katsumi Sameshima has contributed to major companies in the technology sector, including Rohm Co., Ltd. and Ebara Corporation. His roles within these organizations have allowed him to work on cutting-edge technology and improve semiconductor functionalities.

Collaborations

Sameshima has collaborated with esteemed colleagues such as Junichi Hikita and Goro Nakatani. These partnerships have enabled him to leverage diverse insights and expertise in his innovative endeavors, further enhancing his contributions to the semiconductor industry.

Conclusion

Katsumi Sameshima is a distinguished figure in the realm of semiconductor inventions. With a strong patent portfolio and extensive experience in reputable companies, his ongoing innovations continue to shape the future of technology. His dedication to advancing semiconductor design is evident in his work, and he remains a key player in this ever-evolving field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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