The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2009

Filed:

May. 06, 2005
Applicants:

Koji Saito, Tokyo, JP;

Katsumi Sameshima, Kyoto, JP;

Yuuichi Mikata, Yokohama, JP;

Inventors:

Koji Saito, Tokyo, JP;

Katsumi Sameshima, Kyoto, JP;

Yuuichi Mikata, Yokohama, JP;

Assignees:

Ebara Corporation, Tokyo, JP;

Rohm Co., Ltd., Kyoto, JP;

Kabushiki Kaisha Toshiba, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/00 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plating apparatus has a frame configured to be placed on a substrate so that a plating bath is formed by the frame and the substrate. The frame includes a conductive core and a seal member covering the conductive core. The plating apparatus also has a non-conductive porous member configured to be immersed in an electrolytic plating solution held in the plating bath, a counter electrode disposed on the non-conductive porous member so as to face the substrate with a predetermined distance from the substrate, and a feed contact configured to be brought into contact with a peripheral portion of the substrate outside of the frame. The plating apparatus includes a power source operable to apply a voltage between the counter electrode and the substrate and a potential adjuster operable to control a potential of the conductive core of the frame with respect to a potential of the substrate.


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