Albany, NY, United States of America

Katie Lutker-Lee

This inventor holds 20 USPTO granted patents and 10 published patent applications, primarily in Microfabrication Techniques. Top assignee: Tokyo Electron Limited. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katie Lutker-Lee. Retrieved from https://idiyas.com/inventor/katie-lutker-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 95.0

Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Niskayuna, NY (US) (2017 - 2019)
  • Albany, NY (US) (2022 - 2024)

Company Filing History:


Years Active: 2017-2026

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Areas of Expertise:
Patterning
Microfabrication
EUV Resists
Metal Hard Masks
Critical Dimension
Anisotropic Etching
Soft Features
Photolithography
Stability Methods
In-Situ Encapsulation
Dual Damascene Structures
Plasma Etching
20 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Katie Lutker-Lee

Introduction

Katie Lutker-Lee, an accomplished inventor based in Albany, NY, has made remarkable contributions in the field of semiconductor processing. With a strong portfolio comprising 12 patents, she has been instrumental in advancing technologies that enhance manufacturing processes. Her innovative methodologies pave the way for improved efficiency and precision in substrate processing.

Latest Patents

Among her latest patents, two notable inventions stand out. The first is focused on a **photoactive metal-based hard mask integration** method. This process involves depositing a photoactive metal-based hard mask (photo-MHM) over an underlying layer, followed by intricate etching techniques that leverage ultraviolet light (UV) radiation to create features in the photo-MHM. This method enables advanced control in substrate processing, offering significant advantages in the semiconductor manufacturing industry.

Furthermore, she has developed a **method for highly anisotropic etching of titanium oxide spacer using selective top-deposition**. This innovative technique employs a self-aligned multiple patterning (SAMP) process, providing a novel approach to etching titanium oxide spacers. Utilizing an inductively coupled plasma (ICP) etch tool, her one-step etching process enhances efficiency while maintaining the integrity of the mandrel structures.

Career Highlights

Katie is currently associated with Tokyo Electron Limited, a globally recognized leader in semiconductor manufacturing equipment and technology. Her career is marked by a continuous quest for excellence and innovation, where her work contributes to shaping the future of semiconductor technology. Her expertise and insights have made her a valuable asset to her team and the industry.

Collaborations

Throughout her career, Katie has collaborated with esteemed colleagues, including Angelique Denise Raley and Xinghua Sun. Their joint efforts exemplify the strength of teamwork in driving innovation forward. Together, they explore new frontiers in semiconductor technologies, ensuring that industry demands are met with cutting-edge solutions.

Conclusion

Katie Lutker-Lee's journey as an inventor is a testament to the power of innovation in transforming industries. Her latest patents reflect her dedication to advancing semiconductor technologies, providing substantial benefits to the field. As she continues to break new ground, Katie sets a powerful example for aspiring inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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