Union City, CA, United States of America

Kam S Law

This inventor holds 63 USPTO granted patents, primarily in Semiconductor Processing (CPC class 4272). Top assignees: Applied Materials, Inc., Applied Komatsu Technology, Inc., Applied Technology, Inc.. Active years: 1989-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kam S Law. Retrieved from https://idiyas.com/inventor/kam-s-law

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 85.7

Average Co-Inventor Count = 4.3

ph-index = 26

Forward Citations = 5,213(Granted Patents)

Forward Citations (Not Self Cited) = 5,144(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1989-2010

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Areas of Expertise:
Film Deposition
Plasma Etching
Dielectric Layers
Silicon Films
Chemical Vapor Deposition
Active Matrix LCD
Substrate Processing
Microwave Energy
Electrostatic Maintenance
Silicon Nitride
Plasma Display Panel
Cleaning Gas Generation
63 patents (USPTO):Explore Patents

Title: Inventor Kam S Law - Revolutionizing the Tech Industry

Introduction: Kam S Law, a visionary inventor based in Union City, CA, has been making significant strides in the tech industry with his groundbreaking innovations.

Latest Patents: Kam S Law holds several patents in the field of artificial intelligence and renewable energy technologies, showcasing his commitment to creating a sustainable future.

Career Highlights: With a career spanning over two decades, Kam S Law has worked with top tech companies, leading research institutions, and universities to develop cutting-edge solutions that have redefined the industry standards.

Collaborations: Throughout his career, Kam S Law has collaborated with renowned inventors, patent attorneys, and research institutions, fostering a culture of innovation and knowledge sharing within the tech community.

Conclusion: Kam S Law's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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