The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
Sep. 24, 2002
Applicant:
Inventors:
Kam S. Law, Union City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
William R. Harshbarger, San Jose, CA (US);
Dan Maydan, Los Altos Hills, CA (US);
Soo Young Choi, Fremont, CA (US);
Beom Soo Park, San Jose, CA (US);
Sanjay Yadav, San Jose, CA (US);
John M. White, Hayward, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1471 ; H05H 1/46 ;
U.S. Cl.
CPC ...
H01L 2/1471 ; H05H 1/46 ;
Abstract
A method of film layer deposition is described. A film layer is deposited using a cyclical deposition process. The cyclical deposition process consists essentially of a continuous flow of one or more process gases and the alternate pulsing of a precursor and energy to form a film on a substrate structure.
Published as: