The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2006
Filed:
May. 27, 2004
Quanyuan Shang, Saratoga, CA (US);
Sanjay Yadav, Redwood City, CA (US);
William R. Harshbarger, San Jose, CA (US);
Kam S. Law, Union City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
Sanjay Yadav, Redwood City, CA (US);
William R. Harshbarger, San Jose, CA (US);
Kam S. Law, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a cleaning gas in a remote location and then delivering the cleaning gas to the process chamber for cleaning. Such method may further comprise the step of activating the cleaning gas outside the chamber before the delivery of the gas to the chamber. Also provided is a method of eliminating non-cleaning feed gas from the cleaning gas by cryo condensation.