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Applied Komatsu Technology, Inc.

USPTO Granted Patents = 57

Forward Citations = 2,823

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63 inventors (with patents filed for the assignee):

Kam S Law (20 out of 63 patents)

John M White (18 out of 256 patents)

Wendell T Blonigan (12 out of 61 patents)

4. Quanyuan Shang (10 out of 56 patents)

5. Robert M Robertson (9 out of 23 patents)

6. Dan Maydan (6 out of 102 patents)

7. Akihiro Hosokawa (6 out of 40 patents)

8. Emanuel Beer (6 out of 24 patents)

9. Richard Ernest Demaray (6 out of 38 patents)

10. Yuen-Kui (Jerry) Wong (6 out of 9 patents)

11. Carl A Sorensen (5 out of 39 patents)

12. Michael W Richter (5 out of 10 patents)

13. Yuh-Jia (Jim) Su (5 out of 20 patents)

14. Shinichi Kurita (4 out of 106 patents)

15. Norman L Turner (4 out of 35 patents)

Core Competencies:

Substrate Processing

Plasma Source Technology

Sputtering Techniques

Film Deposition

Gas Flow Control

Chamber Cleaning

Automated Systems

Magnetic Drive Shuttles

Silicon Nitride Reduction

Endpoint Detection

Vacuum Chamber Shields

Electrostatic Flatness Maintenance

57 patents: Sort by Forward Citations

1. 6647993 - Surface-treated shower head for use in a substrate processing chamber (2003-11-18),

2. 6552297 - RF matching network with distributed outputs (2003-04-22),

3. 6534007 - Method and apparatus for detecting the endpoint of a chamber cleaning (2003-03-18),

4. 6517303 - Substrate transfer shuttle (2003-02-11),

5. 6472329 - Etching aluminum over refractory metal with successive plasmas (2002-10-29),

6. 6471459 - Substrate transfer shuttle having a magnetic drive (2002-10-29),

7. 6468601 - Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology (2002-10-22),

8. 6435868 - Multi-function chamber for a substrate processing system (2002-08-20),

9. 6432203 - Heated and cooled vacuum chamber shield (2002-08-13),

10. 6371712 - Support frame for substrates (2002-04-16),

11. 6362097 - Collimated sputtering of semiconductor and other films (2002-03-26),

12. 6359250 - RF matching network with distributed outputs (2002-03-19),

13. 6355108 - Film deposition using a finger type shadow frame (2002-03-12),

14. 6352910 - Method of depositing amorphous silicon based films having controlled conductivity (2002-03-05),

15. 6308932 - Isolation valves (2001-10-30),

Applied Komatsu Technology, Inc. is a leading technology solutions provider specializing in innovative Komatsu machine control and data management systems. With a focus on enhancing efficiency and productivity for construction, mining, and forestry industries, Applied Komatsu Technology offers cutting-edge solutions that integrate advanced technologies, including GPS, machine guidance, and telematics. Our goal is to empower our clients with intelligent and reliable solutions that optimize their operations, improve safety, and drive sustainable growth.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

57 Patents

#649 in Tokyo

#1,540 in Japan

#12,152 in the World

Applied Komatsu Technology, Inc.

Forward Citations = 2,823

63 inventors:

Kam S Law (20 out of 63 patents)

John M White (18 out of 256 patents)

Wendell T Blonigan (12 out of 61 patents)

4. Quanyuan Shang (10 out of 56 patents)

5. Robert M Robertson (9 out of 23 patents)

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