Cupertino, CA, United States of America

Yuh-Jia (Jim) Su

This inventor holds 20 USPTO granted patents, primarily in Plasma Etching Technology. Top assignees: Applied Materials, Inc., Novellus Systems Incorporated, Applied Komatsu Technology, Inc.. Active years: 1995-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuh-Jia (Jim) Su. Retrieved from https://idiyas.com/inventor/yuh-jia-jim-su

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 85.0

Average Co-Inventor Count = 2.8

ph-index = 15

Forward Citations = 1,862(Granted Patents)


Location History:

  • Taipai, TW (1999)
  • Cupertino, CA (US) (1995 - 2011)

Company Filing History:


Years Active: 1995-2011

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Areas of Expertise:
Post-Etch Cleans
Plasma Reactor
Electrostatic Chuck
Tapered Dielectric Etch
Indium Oxides
Gas Distribution Plate
Particle Contamination
Dual Source Plasma
20 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Yuh-Jia (Jim) Su**

Introduction

Yuh-Jia (Jim) Su, based in Cupertino, CA, is an accomplished inventor with a remarkable portfolio of 20 patents. His work primarily focuses on enhancing processes in semiconductor manufacturing, particularly in cleaning methodologies post-etching.

Latest Patents

One of Su's latest inventions is a method for post-etch cleans, which presents a cleaning process that increases efficiency while minimizing damage to device structures. The process entails a sequence of cleaning steps: after etching and photoresist stripping, a first plasma clean is performed, which may involve multiple steps. This is followed by a first hydrogen-oxygen (HO) based clean, which can take forms such as a de-ionized water rinse, water vapor clean, or a plasma clean that includes hydrogen and oxygen. A second plasma clean follows, again consisting of various steps, before concluding with a second HO based clean. This innovative approach allows for effective cleaning of diverse etches, including metal etches, via etches, contact etches, polysilicon etches, nitride etches, and shallow trench isolation etches. Additionally, the removal of photoresist can be executed before, during, or after these cleaning processes using an oxygen-containing plasma at low temperatures.

Career Highlights

During his illustrious career, Jim Su has made significant contributions while working with leading firms in the semiconductor industry, including Applied Materials, Inc. and Novellus Systems Incorporated. His expertise and innovative mindset have played a crucial role in advancing cleaning technologies in semiconductor fabrication.

Collaborations

Su has collaborated with prominent colleagues in his field, such as Yuen-Kui (Jerry) Wong and Kam S Law. Their combined efforts have further propelled advancements in the cleaning processes essential for maintaining the integrity of semiconductor devices.

Conclusion

Yuh-Jia (Jim) Su's contributions to the field of semiconductor manufacturing through his patents exemplify the importance of innovation in technology. His dedication to developing methods that enhance cleaning efficiency while reducing device damage signifies a noteworthy impact that will continue to influence future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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