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For the Inventor, By the Inventor

San Jose, CA, United States of America

Shinichi Kurita

This inventor holds 107 USPTO granted patents and 16 published patent applications, primarily in Plasma Processing (CPC class C23C16-45565). Top assignees: Applied Materials, Inc., Applied Komatsu Technology, Inc.. Active years: 2001-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Kurita. Retrieved from https://idiyas.com/inventor/shinichi-kurita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 107 

% Patents Active = 70.1

Average Co-Inventor Count = 3.2

ph-index = 18

Forward Citations = 2,461(Granted Patents)

Forward Citations (Not Self Cited) = 2,299(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal103 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal4 out of 57 
 
Applied Komatsu Technology, Inc.
 patents

Years Active: 2001-2026

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Areas of Expertise:
Plasma Enhanced Chemical Vapor Deposition
Film Stress Control
Layer Stack
Gas Flow Guide
Thin Film Encapsulation
Substrate Support
CVD System
Plasma Uniformity
Transfer Robot
Diffuser Plate
Mask Management
Electron Beam Welding
107 patents (USPTO):Explore Patents
1. 12568795 - Assembled grid tray (2026-03-03),
2. 12362149 - Film stress control for plasma enhanced chemical vapor deposition (2025-07-15),
3. 11854771 - Film stress control for plasma enhanced chemical vapor deposition (2023-12-26),
4. 11600642 - Layer stack for display applications (2023-03-07),
5. 11123837 - Method of removal of sharp corners from diffuser plate (2021-09-21),
6. 11094508 - Film stress control for plasma enhanced chemical vapor deposition (2021-08-17),
7. 11049887 - Layer stack for display applications (2021-06-29),
8. 10697062 - Gas flow guide design for uniform flow distribution and efficient purge (2020-06-30),
9. 10655222 - Thin film encapsulation processing system and process kit (2020-05-19),
10. 10604846 - Thin film encapsulation mask preheat and substrate buffer chamber (2020-03-31),
11. 10487401 - Diffuser temperature control (2019-11-26),
12. 10453718 - Slit valve door with moving mating part (2019-10-22),
13. 10373809 - Grooved backing plate for standing wave compensation (2019-08-06),
14. 10312058 - Plasma uniformity control by gas diffuser hole design (2019-06-04),
15. 10280510 - Substrate support assembly with non-uniform gas flow clearance (2019-05-07),

Title: The Innovative Journey of Shinichi Kurita

Introduction: Shinichi Kurita, a talented inventor based in San Jose, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Shinichi Kurita holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: Throughout his illustrious career, Shinichi Kurita has worked with leading tech companies in Silicon Valley, spearheading research and development projects that have pushed the boundaries of innovation. His passion for creating cutting-edge solutions has led to the successful commercialization of several groundbreaking products.

Collaborations: Shinichi Kurita has collaborated with top researchers, engineers, and scientists from renowned universities and research institutions worldwide, fostering a culture of innovation and knowledge sharing. His collaborative efforts have resulted in the development of revolutionary technologies that have the potential to shape the future.

Conclusion: Shinichi Kurita's relentless pursuit of innovation and his commitment to pushing the boundaries of technology have established him as a visionary inventor in the field. His contributions continue to inspire the next generation of inventors and pave the way for a more technologically advanced future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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