The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Sep. 28, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Qunhua Wang, Santa Clara, CA (US);
Li Hou, Cupertino, CA (US);
Ki Woon Kim, Gumi, KR;
Shinichi Kurita, San Jose, CA (US);
Tae Kyung Won, San Jose, CA (US);
Suhail Anwar, Saratoga, CA (US);
Beom Soo Park, San Jose, CA (US);
Robin L. Tiner, Santa Cruz, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.