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For the Inventor, By the Inventor

San Jose, CA, United States of America

Qunhua Wang

This inventor holds 19 USPTO granted patents and 4 published patent applications, primarily in Plasma Processing. Top assignee: Applied Materials, Inc.. Active years: 2005-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Qunhua Wang. Retrieved from https://idiyas.com/inventor/qunhua-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 84.2

Average Co-Inventor Count = 4.7

ph-index = 7

Forward Citations = 1,566(Granted Patents)


Location History:

  • San Jose, CA (US) (2005 - 2020)
  • Santa Clara, CA (US) (2015 - 2023)

Company Filing History:

goldMedal19 out of 14,502 
 
Applied Materials, Inc.
 patents

Years Active: 2005-2023

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Areas of Expertise:
Gas Confiner Assembly
Plasma Uniformity Control
Silicon Thickness Uniformity
Showerhead Support Structure
Film Deposition
Shadow Frame
Argon Gas Dilution
Multi-layer Amorphous Silicon
Run-to-run Stability
PECVD-deposited Thin Films
Flow Blocker Plate
Cross Beam Structure
19 patents (USPTO):Explore Patents
1. 11773489 - Gas confiner assembly for eliminating shadow frame (2023-10-03),
2. 10697063 - Corner spoiler for improving profile uniformity (2020-06-30),
3. 10676817 - Flip edge shadow frame (2020-06-09),
4. 10312058 - Plasma uniformity control by gas diffuser hole design (2019-06-04),
5. 10262837 - Plasma uniformity control by gas diffuser hole design (2019-04-16),
6. 10087524 - Showerhead support structure for improved gas flow (2018-10-02),
7. 9818606 - Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixture (2017-11-14),
8. 9299558 - Run-to-run stability of film deposition (2016-03-29),
9. 9287137 - Methods for depositing a silicon containing layer with argon gas dilution (2016-03-15),
10. 9200368 - Plasma uniformity control by gas diffuser hole design (2015-12-01),
11. 9048099 - Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser anneal (2015-06-02),
12. 8721791 - Showerhead support structure for improved gas flow (2014-05-13),
13. D664249 - Flow blocker plate (2012-07-24),
14. 8083853 - Plasma uniformity control by gas diffuser hole design (2011-12-27),
15. 8002896 - Shadow frame with cross beam for semiconductor equipment (2011-08-23),

Title: Inventor Qunhua Wang: Revolutionizing Technology in San Jose

Introduction: Qunhua Wang is a visionary inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wang holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Wang has worked with leading tech companies in Silicon Valley, spearheading research and development projects that have led to significant technological breakthroughs.

Collaborations: Wang has collaborated with top researchers, engineers, and scientists from renowned universities and research institutions worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Qunhua Wang's relentless pursuit of innovation and his passion for creating cutting-edge technologies continue to inspire the next generation of inventors and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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