The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Aug. 07, 2012
Qunhua Wang, San Jose, CA (US);
Soo Young Choi, Fremont, CA (US);
Robin L. Tiner, Santa Cruz, CA (US);
John M. White, Hayward, CA (US);
Gaku Furuta, Sunnyvale, CA (US);
Beom Soo Park, San Jose, CA (US);
Qunhua Wang, San Jose, CA (US);
Soo Young Choi, Fremont, CA (US);
Robin L. Tiner, Santa Cruz, CA (US);
John M. White, Hayward, CA (US);
Gaku Furuta, Sunnyvale, CA (US);
Beom Soo Park, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.