The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Dec. 01, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Shinichi Kurita, San Jose, CA (US);
Srikanth V. Racherla, Fremont, CA (US);
Suhas Bhoski, Bangalore, IN;
Xiangxin Rui, Campbell, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/04 (2006.01); C23C 16/458 (2006.01); C23C 16/44 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/042 (2013.01); C23C 16/4401 (2013.01); C23C 16/4412 (2013.01); C23C 16/458 (2013.01); C23C 16/45529 (2013.01); C23C 16/45542 (2013.01); C23C 16/45582 (2013.01); C23C 16/45585 (2013.01); C23C 16/54 (2013.01); C23C 16/45565 (2013.01);
Abstract
The present disclosure relates to methods and apparatus for a thin film encapsulation (TFE). In one embodiment a process kit for use in an atomic layer deposition (ALD) chamber is disclosed and includes a dielectric window, a sealing frame, and a mask frame connected with the sealing frame, wherein the mask frame has a gas inlet channel and a gas outlet channel formed therein on opposing sides thereof.