Cupertino, CA, United States of America

Akihiro Hosokawa

This inventor holds 40 USPTO granted patents and 1 published patent application, primarily in PVD Technology. Top assignees: Applied Materials, Inc., Applied Komatsu Technology, Inc.. Active years: 1992-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiro Hosokawa. Retrieved from https://idiyas.com/inventor/akihiro-hosokawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 40 

% Patents Active = 57.5

Average Co-Inventor Count = 2.2

ph-index = 17

Forward Citations = 2,251(Granted Patents)


Location History:

  • San Jose, CA (US) (1992)
  • Cupertino, CA (US) (1994 - 2019)

Company Filing History:


Years Active: 1992-2019

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Areas of Expertise:
PVD Technology
Target Cooling
Sputtering Systems
Substrate Processing
Magnetron
Gas Distribution
Heat Sensor
Uniform Heating
Bonding Agent
Metrology Tools
Automated Systems
Electron Beam Welding
40 patents (USPTO):Explore Patents

Title: The Innovative Journey of Akihiro Hosokawa

Introduction: Akihiro Hosokawa is a visionary inventor based in Cupertino, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Akihiro Hosokawa holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Akihiro Hosokawa has worked with leading tech companies, spearheading research and development projects that have revolutionized the industry.

Collaborations: Throughout his career, Akihiro Hosokawa has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and creativity that has led to numerous breakthrough inventions.

Conclusion: Akihiro Hosokawa's relentless pursuit of innovation and his passion for creating cutting-edge technologies continue to inspire the next generation of inventors and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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