The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Jun. 23, 2006
Makoto Inagawa, Palo Alto, CA (US);
Bradley O. Stimson, Monte Sereno, CA (US);
Akihiro Hosokawa, Cupertino, CA (US);
Hienminh Huu Le, San Jose, CA (US);
Jrjyan Jerry Chen, Santa Clara, CA (US);
Makoto Inagawa, Palo Alto, CA (US);
Bradley O. Stimson, Monte Sereno, CA (US);
Akihiro Hosokawa, Cupertino, CA (US);
Hienminh Huu Le, San Jose, CA (US);
Jrjyan Jerry Chen, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A physical vapor deposition target assembly is configured to isolate a target-bonding layer from a processing region. In one embodiment, the target assembly comprises a backing plate, a target having a first surface and a second surface, and a bonding layer disposed between the backing plate and the second surface. The first surface of the target is in fluid contact with a processing region and the second surface of the target is oriented toward the backing plate. The target assembly may include multiple targets.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile