The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Jan. 18, 2012
Applicants:

Akihiro Hosokawa, Cupertino, CA (US);

Bradley O. Stimson, Monte Sereno, CA (US);

Hienminh Huu Le, San Jose, CA (US);

Makoto Inagawa, Palo Alto, CA (US);

Inventors:

Akihiro Hosokawa, Cupertino, CA (US);

Bradley O. Stimson, Monte Sereno, CA (US);

Hienminh Huu Le, San Jose, CA (US);

Makoto Inagawa, Palo Alto, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/04 (2006.01); H01J 37/32 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/50 (2013.01); C23C 14/564 (2013.01); H01J 37/32458 (2013.01); H01J 37/32623 (2013.01); H01J 37/32651 (2013.01); H01J 37/32715 (2013.01);
Abstract

The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the shadow frame to reduce the amount of material that may deposit on the shadow frame during processing. The top shield may be cooled to reduce the amount of fluxuation in temperature of the top shield and shadow frame during processing and/or during down time.


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