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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Robert M Robertson

This inventor holds 23 USPTO granted patents, primarily in Thin Film Deposition. Top assignees: Applied Materials, Inc., Applied Komatsu Technology, Inc., Applied Technology, Inc.. Active years: 1993-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert M Robertson. Retrieved from https://idiyas.com/inventor/robert-m-robertson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23

% Patents Active = 95.7

Average Co-Inventor Count = 4.3

ph-index = 14

Forward Citations = 1,119(Granted Patents)


Location History:

  • Menlo Park, CA (US) (1999)
  • Palo Alto, CA (US) (1993 - 2002)
  • Saratoga, CA (US) (2002)
  • Santa Clara, CA (US) (2000 - 2005)

Company Filing History:

goldMedal13 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal9 out of 57 
 
Applied Komatsu Technology, Inc.
 patents
bronzeMedal1 out of 2 
 
Applied Technology, Inc.
 patents

Years Active: 1993-2005

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Areas of Expertise:
Thin Film Deposition
Silicon Nitride
Amorphous Silicon
Chemical Vapor Deposition
Plasma CVD
Annealing Techniques
Substrate Flatness
Conformal Films
Multilayer Processing
High Deposition Rates
Remote Plasma Cleaning
Microwave Annealing
23 patents (USPTO):Explore Patents
1. 6902682 - Method and apparatus for electrostatically maintaining substrate flatness (2005-06-07),
2. 6610374 - Method of annealing large area glass substrates (2003-08-26),
3. 6500265 - Apparatus for electrostatically maintaining subtrate flatness (2002-12-31),
4. 6468601 - Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology (2002-10-22),
5. 6444277 - Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates (2002-09-03),
6. 6355108 - Film deposition using a finger type shadow frame (2002-03-12),
7. 6352910 - Method of depositing amorphous silicon based films having controlled conductivity (2002-03-05),
8. 6338874 - Method for multilayer CVD processing in a single chamber (2002-01-15),
9. 6294219 - Method of annealing large area glass substrates (2001-09-25),
10. 6177023 - Method and apparatus for electrostatically maintaining substrate flatness (2001-01-23),
11. 6172322 - Annealing an amorphous film using microwave energy (2001-01-09),
12. 6055927 - Apparatus and method for white powder reduction in silicon nitride (2000-05-02),
13. 6024044 - Dual frequency excitation of plasma for film deposition (2000-02-15),
14. 5902650 - Method of depositing amorphous silicon based films having controlled (1999-05-11),
15. 5861197 - Deposition of high quality conformal silicon oxide thin films on glass (1999-01-19),

Title: The Innovative Journey of Robert M Robertson

Introduction: Robert M Robertson, a distinguished inventor hailing from Saratoga, CA, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Robertson's latest patents include a cutting-edge software application for data encryption and a revolutionary medical device for non-invasive glucose monitoring.

Career Highlights: With over two decades of experience in the tech industry, Robertson has held key positions in renowned companies such as Silicon Valley Tech Solutions and InnovateX. His expertise in software development and hardware design has led to the successful launch of several products in the market.

Collaborations: Throughout his career, Robertson has collaborated with leading researchers from Stanford University and tech giants like Google and Apple. These collaborations have resulted in the development of state-of-the-art technologies that have transformed various industries.

Conclusion: Robert M Robertson's passion for innovation and his relentless pursuit of excellence continue to inspire aspiring inventors worldwide. His remarkable achievements underscore his status as a visionary in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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