logo

For the Inventor, By the Inventor

Seoul, South Korea

Jung-hee Chung

USPTO Granted Patents = 17 

Average Co-Inventor Count = 5.7

ph-index = 4

Forward Citations = 58(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2008 - 2010)
  • Seoul, KR (2005 - 2015)

Company Filing History:

goldMedal17 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2005-2015

Loading Chart...
17 patents (USPTO):Explore Patents
1. 9059330 - Methods of forming integrated circuit capacitors having composite dielectric layers therein containing crystallization inhibiting regions (2015-06-16),
2. 8344439 - Integrated circuit capacitors having composite dielectric layers therein containing crystallization inhibiting regions and methods of forming same (2013-01-01),
3. 7973352 - Capacitors having composite dielectric layers containing crystallization inhibiting regions (2011-07-05),
4. 7781819 - Semiconductor devices having a contact plug and fabrication methods thereof (2010-08-24),
5. 7723770 - Integrated circuit capacitors having composite dielectric layers therein containing crystallization inhibiting regions (2010-05-25),
6. 7655519 - Methods of fabricating metal-insulator-metal capacitors with a chemical barrier layer in a lower electrode (2010-02-02),
7. 7495292 - Integrated circuit devices having pad contact plugs in the cell array and peripheral circuit regions of the integrated circuit substrate (2009-02-24),
8. 7482242 - Capacitor, method of forming the same, semiconductor device having the capacitor and method of manufacturing the same (2009-01-27),
9. 7422943 - Semiconductor device capacitors with oxide-nitride layers and methods of fabricating such capacitors (2008-09-09),
10. 7364967 - Methods of forming storage capacitors for semiconductor devices (2008-04-29),
11. 7304367 - Metal-insulator-metal capacitors including transition metal silicide films on doped polysilicon contact plugs (2007-12-04),
12. 7205219 - Methods of forming integrated circuits devices having pad contact plugs in the cell array and peripheral circuit regions of the integrated circuit substrate (2007-04-17),
13. 7179739 - Methods of forming a semiconductor device including a metal silicide layer between a conductive plug and a bottom electrode of a capacitor (2007-02-20),
14. 7049232 - Methods for forming ruthenium films with β-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same (2006-05-23),
15. 7008837 - Method of manufacturing capacitor by performing multi-stepped wet treatment on surface of electrode (2006-03-07),

Title: The Innovative Contributions of Jung-hee Chung in Integrated Circuit Technology

Introduction

Jung-hee Chung, a prominent inventor based in Seoul, South Korea, has made significant strides in the field of integrated circuit technology. With a remarkable portfolio of 17 patents, Chung's innovative work has influenced advancements in electronic components, particularly in the design and functionality of integrated circuit capacitors.

Latest Patents

Chung's latest patents revolve around "Methods of forming integrated circuit capacitors having composite dielectric layers therein containing crystallization inhibiting regions." These patents describe how integrated circuit capacitors can be enhanced by composite dielectric layers that include regions to inhibit crystallization. This technology is crucial in increasing the overall crystallization temperature of capacitor components, allowing for better performance and reliability. The capacitors feature a dielectric layer that comprises a first dielectric layer adjacent to the first capacitor electrode, a second dielectric layer next to the second capacitor electrode, and an electrically insulating crystallization inhibiting layer between the two. This innovative design utilizes materials with higher crystallization temperature characteristics, which further improve the efficiency of integrated circuits.

Career Highlights

Jung-hee Chung is affiliated with Samsung Electronics Co., Ltd., a global leader in technology and electronics. His contributions have played a vital role in advancing Samsung's initiatives in semiconductor innovation. Chung's ability to address complex challenges in the design and functionality of electronic components has earned him recognition within the industry, solidifying his status as a key inventor.

Collaborations

Throughout his career, Chung has collaborated with talented professionals, including Jae-hyoung Choi and Cha-young Yoo. Their collective expertise has fostered innovation and development in the field, leading to groundbreaking technologies that continue to shape the future of integrated circuit design.

Conclusion

Jung-hee Chung's contributions to integrated circuit technology through his inventive patents demonstrate the critical role of innovation in electronics. His work not only enhances the performance of integrated circuit capacitors but also sets the stage for future advancements within the industry. As technology evolves, inventors like Chung will undeniably continue to influence the landscape of electronic innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…