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For the Inventor, By the Inventor

Taichung, Taiwan

Jung-Hao Chang

USPTO Granted Patents = 20

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:

goldMedal20 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2018-2025

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20 patents (USPTO):Explore Patents
1. 12396205 - Semiconductor device having fins and method of fabricating the same (2025-08-19),
2. 12356646 - Semiconductor device and method for manufacturing the same (2025-07-08),
3. 12218219 - Spacer structure for semiconductor device (2025-02-04),
4. 12198939 - Technique for semiconductor manufacturing (2025-01-14),
5. 12154969 - Semiconductor device structure with metal gate stack (2024-11-26),
6. 12087558 - Ion beam etching apparatus and method (2024-09-10),
7. 12027625 - Semiconductor device having fins and method of fabricating the same (2024-07-02),
8. 11843041 - Gate etch back with reduced loading effect (2023-12-12),
9. 11769822 - Semiconductor device and method for manufacturing the same (2023-09-26),
10. 11522065 - Gate etch back with reduced loading effect (2022-12-06),
11. 11515423 - Semiconductor device having fins (2022-11-29),
12. 11476365 - Fin field effect transistor device structure and method for forming the same (2022-10-18),
13. 11373878 - Technique for semiconductor manufacturing (2022-06-28),
14. 11183580 - Structure and formation method of semiconductor device with metal gate stack (2021-11-23),
15. 11107907 - Semiconductor device and method for manufacturing the same (2021-08-31),

Certainly! Here is the article about inventor Jung-Hao Chang:

Title: Jung-Hao Chang: Pioneering Innovator in Taichung

Introduction:

Inventor Jung-Hao Chang's dedication to innovation and passion for creating solutions that enhance lives have solidified his reputation as a pioneering inventor in Taichung, Taiwan, and beyond. With an impressive portfolio of 13 patents, Chang continues to inspire future generations of innovators with his groundbreaking work.

Latest Patents:

Chang's latest patents include "Gate etch back with reduced loading effect" and "Semiconductor device and method for manufacturing the same," which demonstrate his expertise in semiconductor technology. These inventions showcase his ingenuity in developing advanced solutions to improve the efficiency and performance of semiconductor devices.

Career Highlights:

Jung-Hao Chang is valued for his contributions at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), where he plays a key role in advancing semiconductor technology. His innovative approach and technical expertise have been instrumental in driving forward the company's success in the highly competitive industry.

Collaborations:

Chang collaborates closely with esteemed colleagues such as Li-Te S Lin and Pinyen Lin, who share his passion for innovation and excellence. Together, they work towards pushing the boundaries of technology and creating cutting-edge solutions that meet the evolving needs of the semiconductor industry.

Conclusion:

In conclusion, Jung-Hao Chang's trailblazing spirit and commitment to innovation have established him as a leading figure in the field of invention. His remarkable contributions to semiconductor technology not only benefit the industry but also pave the way for future advancements. Chang's legacy as a visionary inventor in Taichung, Taiwan, serves as an inspiration to aspiring innovators worldwide.

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