Taichung, Taiwan

Jung-Hao Chang

This inventor holds 22 USPTO granted patents and 6 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Hao Chang. Retrieved from https://idiyas.com/inventor/jung-hao-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Multi-Gate Device
Low Contact Resistance
Gate Etch
Semiconductor Device
Fins
Metal Gate Stack
Ion Beam Etching
Fin Field Effect Transistor
Interconnect Structures
CMOS Device
22 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Jung-Hao Chang:

Title: Jung-Hao Chang: Pioneering Innovator in Taichung

Introduction:

Inventor Jung-Hao Chang's dedication to innovation and passion for creating solutions that enhance lives have solidified his reputation as a pioneering inventor in Taichung, Taiwan, and beyond. With an impressive portfolio of 13 patents, Chang continues to inspire future generations of innovators with his groundbreaking work.

Latest Patents:

Chang's latest patents include "Gate etch back with reduced loading effect" and "Semiconductor device and method for manufacturing the same," which demonstrate his expertise in semiconductor technology. These inventions showcase his ingenuity in developing advanced solutions to improve the efficiency and performance of semiconductor devices.

Career Highlights:

Jung-Hao Chang is valued for his contributions at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), where he plays a key role in advancing semiconductor technology. His innovative approach and technical expertise have been instrumental in driving forward the company's success in the highly competitive industry.

Collaborations:

Chang collaborates closely with esteemed colleagues such as Li-Te S Lin and Pinyen Lin, who share his passion for innovation and excellence. Together, they work towards pushing the boundaries of technology and creating cutting-edge solutions that meet the evolving needs of the semiconductor industry.

Conclusion:

In conclusion, Jung-Hao Chang's trailblazing spirit and commitment to innovation have established him as a leading figure in the field of invention. His remarkable contributions to semiconductor technology not only benefit the industry but also pave the way for future advancements. Chang's legacy as a visionary inventor in Taichung, Taiwan, serves as an inspiration to aspiring innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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