Aalen, Germany

Johannes Zellner

USPTO Granted Patents = 14 

 

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Oberkochen, DE (2009)
  • Aalen, DE (2010 - 2020)

Company Filing History:


Years Active: 2009-2020

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14 patents (USPTO):

Title: Innovations of Johannes Zellner

Introduction

Johannes Zellner is a prominent inventor based in Aalen, Germany. He has made significant contributions to the field of microlithography and EUV technology. With a total of 14 patents to his name, Zellner's work has advanced the efficiency and effectiveness of projection exposure apparatuses.

Latest Patents

One of his latest patents is the EUV collector for use in an EUV projection exposure apparatus. This innovative collector guides EUV used light emitted by a plasma source region. The design features an overall impingement surface that is impacted by radiation from the plasma source. The collector efficiently directs the used light while managing extraneous light radiation, ultimately leading to increased efficiency and reduced production costs. Another notable patent is the projection objective of a microlithographic projection exposure apparatus. This invention includes a wavefront correction device with a refractive optical element that corrects wavefront errors through a unique temperature distribution caused by heating light.

Career Highlights

Zellner has worked with notable companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His experience in these organizations has allowed him to develop cutting-edge technologies that are crucial in the field of optics and lithography.

Collaborations

Throughout his career, Johannes Zellner has collaborated with esteemed colleagues, including Hans-Juergen Mann and Wilhelm Ulrich. These partnerships have fostered innovation and have contributed to the advancement of their shared field.

Conclusion

Johannes Zellner's contributions to the field of microlithography and EUV technology are noteworthy. His innovative patents and collaborations have significantly impacted the industry, showcasing his expertise and dedication to advancing technology.

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