The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Mar. 06, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Johannes Zellner, Aalen, DE;
Boris Bittner, Roth, DE;
Norbert Wabra, Werneck, DE;
Martin von Hodenberg, Oberkochen, DE;
Sonja Schneider, Oberkochen, DE;
Ricarda Schoemer, Zusmarshausen, DE;
Arne Schob, Jena, DE;
Guenter Rudolph, Jena, DE;
Alexander Gratzke, Jena, DE;
Bryce Anton Moffat, Jena, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.