Location History:
- Tai-Chung, TW (2002)
- Tai-Chiung, TW (2002)
- Tainan, TW (2003)
- Hsinchu, TW (2001 - 2014)
Company Filing History:
21 out of 7,087 
13 out of 40,848 
1 out of 3,603 
Years Active: 2001-2014
Title: Jiunn-Ren Hwang: Innovator in Semiconductor Technology
Introduction
Jiunn-Ren Hwang is a distinguished inventor based in Hsin-Chu, Taiwan, with an impressive portfolio of 36 patents to his name. His work primarily focuses on advancements in semiconductor technologies, contributing significantly to the fields of thermal annealing and SONOS gate structures.
Latest Patents
Among his latest innovations is a patent for a dummy pattern design for thermal annealing. This patent describes a semiconductor structure that includes a device region and an adjacent dummy region, equipped with a multitude of active and dummy active regions. The design ensures that the thermal annealing effect in both the dummy region and the device region are substantially equivalent, enhancing the efficiency and performance of semiconductor devices.
Another notable patent from Jiunn-Ren Hwang describes a method for fabricating a SONOS gate structure with dual-thickness oxide. This method outlines the step-by-step process of forming a gate pattern with sidewalls on a substrate, and developing multiple oxide layers, aimed at improving the efficacy of gate dielectric structures in semiconductor applications.
Career Highlights
Jiunn-Ren Hwang has made significant strides in his career, having worked with prestigious firms such as United Microelectronics Corporation and Taiwan Semiconductor Manufacturing Company Limited. These roles have allowed him to utilize his expertise and innovate in semiconductor development.
Collaborations
Throughout his career, Hwang has collaborated with talented individuals, including I-Hsiung Huang and Tzyh-Cheang Lee. These partnerships have undoubtedly contributed to the advancement of his innovative projects and further established his reputation in the semiconductor industry.
Conclusion
Jiunn-Ren Hwang's contributions to semiconductor technology are noteworthy. With a solid patent portfolio and collaboration with industry experts, he continues to push the boundaries of innovation in this critical field. His latest patents on dummy pattern designs and SONOS gate structures illustrate his commitment to enhancing semiconductor performance and efficiency.