The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Dec. 19, 2006
Applicants:
Tzyh-cheang Lee, Hsinchu, TW;
Jiunn-ren Hwang, Hsinchu, TW;
Tsung-lin Lee, Hsinchu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
Abstract
Non-volatile memory device with polysilicon spacer and method of forming the same. A dielectric layer lines a sidewall of a polysilicon gate. A polysilicon spacer is patterned on the dielectric layer adjacent to the sidewall of the polysilicon gate. A protection spacer is patterned on the dielectric layer and disposed on the polysilicon spacer adjacent to the sidewall of the conductive gate for preventing a shortage path between the polysilicon gate and the polysilicon spacer during a subsequent silicidation process.