Company Filing History:
Years Active: 2006-2012
Title: The Innovative Contributions of Ji Soo Kim
Introduction
Ji Soo Kim is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of semiconductor manufacturing, holding a total of 11 patents. His work focuses on advanced etching processes that enhance the efficiency and precision of semiconductor fabrication.
Latest Patents
One of Ji Soo Kim's latest patents is titled "Plasma process with photoresist mask pretreatment." This method involves etching features in a dielectric layer through a photoresist (PR) mask. The PR mask is patterned using laser light with a wavelength not exceeding 193 nm. The process includes pre-treating the PR mask with a noble gas plasma, followed by multiple cycles of a plasma process. Each cycle consists of a deposition phase that deposits a layer over the PR mask and a shaping phase that shapes this layer.
Another notable patent is the "Infinitely selective photoresist mask etch." This method allows for etching features into an etch layer beneath a photoresist mask without the need for an intermediate hardmask. The process involves several etch cycles, each comprising a deposition etch phase that etches features into the etch layer while depositing polymer on the sidewalls, followed by a cleaning phase that removes the polymer.
Career Highlights
Ji Soo Kim is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative approaches have contributed to the advancement of etching technologies, making significant impacts on the efficiency of semiconductor manufacturing processes.
Collaborations
Throughout his career, Ji Soo Kim has collaborated with notable colleagues, including S M Reza Sadjadi and Sangheon Lee. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Ji Soo Kim's contributions to semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the industry, paving the way for future advancements in technology.