The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Jun. 20, 2003
Douglas L. Keil, Fremont, CA (US);
Lumin LI, Santa Clara, CA (US);
Eric A. Hudson, Berkeley, CA (US);
Reza Sadjadi, Saratoga, CA (US);
Eric H. Lenz, Pleasanton, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Ji Soo Kim, Pleasanton, CA (US);
Douglas L. Keil, Fremont, CA (US);
Lumin Li, Santa Clara, CA (US);
Eric A. Hudson, Berkeley, CA (US);
Reza Sadjadi, Saratoga, CA (US);
Eric H. Lenz, Pleasanton, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Ji Soo Kim, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma processing apparatus for processing a substrate is provided. A plasma processing chamber with chamber walls is provided. A substrate support is provided within the chamber walls. At least one confinement ring is provided, where the confinement ring and the substrate support define a plasma volume. A magnetic source for generating a magnetic field for magnetically enhancing physical confinement provided by the at least one confinement ring is provided.