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Douglas L Keil

This inventor holds 54 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing (CPC class H01J). Top assignees: Lam Research Corporation, Novellus Systems Incorporated. Active years: 2001-2025.

USPTO Granted Patents = 54 (Patent Applications = 5)

% Patents Active = 85.2

Average Co-Inventor Count = 3.5

ph-index = 10

Forward Citations = 656(Granted Patents)

Forward Citations (Not Self Cited) = 583(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Fremont, CA (US) (2001 - 2015)
West Linn, OR (US) (2016 - 2024)

Company Filing History:

47 out of 3,936

Lam Research Corporation

patents

7 out of 993

Novellus Systems Incorporated

patents

Years Active: 2001-2025

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Areas of Expertise:

Plasma Instability

Parasitic Plasma

Substrate Processing

Film Thickness

Electrical Asymmetry

Metrology Methods

Capacitively-Coupled Probe

Reactive Species

Wafer Non-Uniformity

Cleaning Process

Electrical Characteristics

Magnetic Enhancement

54 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12308216 - Mechanical suppression of parasitic plasma in substrate processing chamber (2025-05-20),

2. 11862435 - Mechanical suppression of parasitic plasma in substrate processing chamber (2024-01-02),

3. 11725282 - Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region (2023-08-15),

4. 11621150 - Mechanical suppression of parasitic plasma in substrate processing chamber (2023-04-04),

5. 11393729 - Systems and methods for controlling plasma instability in semiconductor fabrication (2022-07-19),

6. 11127567 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2021-09-21),

7. 11111581 - Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region (2021-09-07),

8. 10876209 - Systems and methods for determining film thickness using DC self-bias voltage (2020-12-29),

9. 10665429 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2020-05-26),

10. 10510625 - Systems and methods for controlling plasma instability in semiconductor fabrication (2019-12-17),

11. 10475627 - Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition (2019-11-12),

12. 10378109 - Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage (2019-08-13),

13. 10287683 - Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region (2019-05-14),

14. 10224182 - Mechanical suppression of parasitic plasma in substrate processing chamber (2019-03-05),

15. 10128160 - Systems and methods for detection of plasma instability by electrical measurement (2018-11-13),

Title: Douglas L. Keil: Innovator in Substrate Processing Technologies

Introduction

Douglas L. Keil, based in Fremont, California, is a prolific inventor recognized for his substantial contributions to the field of substrate processing. With an impressive portfolio of 53 patents, his work primarily focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

Among his latest innovations, Keil has developed a patent titled "Mechanical suppression of parasitic plasma in substrate processing chamber". This innovative system features an electrode that incorporates a showerhead with unique design elements such as a first stem portion and a head portion. It employs a stack of dielectric layers to effectively create multiple gaps that work together to prevent parasitic plasma formation between the electrode and a conducting structure's surface. Another significant patent, "Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region", details a method for operating a substrate processing chamber. This method involves a specific configuration of a showerhead that optimally distributes process gas, while effectively purging unwanted elements from the system, ensuring a cleaner and more efficient substrate processing environment.

Career Highlights

Throughout his career, Douglas L. Keil has lent his expertise to leading companies in the semiconductor industry, including Lam Research Corporation and Novellus Systems Incorporated. His innovative spirit and technical knowledge have made significant impacts in these organizations, propelling advancements in substrate technology.

Collaborations

Keil has collaborated with esteemed professionals in the field, including Edward J Augustyniak and Karl Frederick Leeser. These partnerships have contributed to the enhancement of substrate processing methods and the development of effective technical solutions.

Conclusion

Douglas L. Keil stands out as a vital contributor to the advancement of substrate processing technologies. His innovative patents and collaboration with industry experts emphasize his commitment to driving progress in the semiconductor arena. Through his work, Keil continues to shape the future of substrate processing with groundbreaking inventions that enhance efficiency and performance.

Profile summary based on public USPTO records.

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