Geldrop, Netherlands

Jeroen Gerard Gosen

This inventor holds 14 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Lithographic Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2014-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeroen Gerard Gosen. Retrieved from https://idiyas.com/inventor/jeroen-gerard-gosen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14 

% Patents Active = 71.4

 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Geldrop, NL (2014 - 2018)
  • Mountain View, CA (US) (2021)
  • Mierlo, NL (2022)
  • Veldhoven, NL (2021 - 2023)
  • Westport, CT (US) (2022 - 2023)

Company Filing History:


Years Active: 2014-2025

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Areas of Expertise:
Wafer Thermal Conditioning
Charged Particle Beam
Lithographic Apparatus
Device Manufacturing
Pressure Control Valve
Electron Beam Inspection
Fluid Handling Structure
Cooling Objective Lens
Particle Beam Inspection
Illumination System
Projection System
Heat Load Control
14 patents (USPTO):Explore Patents

Title: Jeroen Gerard Gosen - Innovating Particle Beam Inspection Technology

Introduction:

Jeroen Gerard Gosen, a prolific inventor based in Geldrop, Netherlands, has made significant contributions in the field of charged particle beam apparatus. With a total of 13 patents to his name, Gosen's latest innovations focus on enhancing the efficiency and performance of particle beam inspection systems.

Latest Patents:

1. "System and Methods for Thermally Conditioning a Wafer in a Charged Particle Beam Apparatus": This patent showcases an improved particle beam inspection apparatus with a thermal conditioning station. The apparatus scans the wafer, measures characteristics of the structures, analyzes them, determines temperature characteristics, and adjusts the thermal conditioning station accordingly.

2. "Systems and Methods of Cooling Objective Lens of a Charged-Particle Beam System": This patent discloses innovative cooling systems for the objective lens of a charged-particle beam system. It involves a fluid circulation process via a bobbin structure to absorb heat generated by electromagnetic coils, ultimately enhancing cooling efficiency during operations.

Career Highlights:

Gosen has honed his expertise while working at notable companies such as ASML Netherlands B.V. and ASML Holding N.V. These experiences have provided him with a platform to explore cutting-edge technologies and drive advancements in the semiconductor industry.

Collaborations:

During his career, Gosen has collaborated with esteemed professionals such as Frank Johannes Jacobus Van Boxtel and Martijn Petrus Christianus Van Heumen. Together, they have synergized their skills and knowledge to push the boundaries of innovation in particle beam inspection technology.

Conclusion:

In conclusion, Jeroen Gerard Gosen's inventive spirit and dedication to advancing particle beam inspection technology have solidified his position as a trailblazer in the industry. His groundbreaking patents and collaborations underscore his commitment to driving progress and shaping the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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