The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Mar. 17, 2011
Jeroen Gerard Gosen, Geldrop, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Bart Dinand Paarhuis, Waalre, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Jinggao LI, Fairfield, CT (US);
Jeroen Gerard Gosen, Geldrop, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Bart Dinand Paarhuis, Waalre, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Jinggao Li, Fairfield, CT (US);
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.